Summary
Jeff Nettleton is a Sr. Advanced Technology Engineer with 14 years of hands-on semiconductor manufacturing and process engineering experience across silicon and III-V fabs, currently advancing photolithography and integration at nLIGHT. He brings deep technical mastery of photolithography tools (steppers, mask aligners, EBPG ebeam), liftoff and wet chemistry, dry etch, anneal, and metrology suites (SEM/FIB/EDX, AFM, Zygo, ellipsometry) plus practical ownership of capital equipment specification and qualification. His background includes leading photolithography for L1 fabs at Raytheon and driving yield-improving corrective actions and process development at Lockheed Martin, where he combined statistical DOE and hands-on failure analysis to deliver multi-million dollar cost avoidance. Conversational Japanese and an unusual academic path—an MA in Applied Orthodox Theology alongside a BS in Physics—underscore a disciplined, curious thinker who pairs technical rigor with cross-cultural communication.
14 years of coding experience
13 years of employment as a software developer
Master of Arts - MA, Applied Orthodox Theology, Master of Arts - MA, Applied Orthodox Theology at University of Balamand
Bachelor of Science, Physics, 3.76 Cumulative GPA, Bachelor of Science, Physics, 3.76 Cumulative GPA at Portland State University
Diploma, Applied Orthodox Theology, Diploma, Applied Orthodox Theology at Antiochian House of Studies/St. Stephen's Program