Luuk Visser

Software Platform Architect Metrology Expose DUV

Netherlands
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Summary

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Luuk Visser is a software platform architect with 13 years’ experience designing metrology and image-quality software for ASML’s DUV lithography products. He combines deep technical leadership—currently as Software Platform Architect Metrology Expose DUV—with hands-on algorithm and software design experience dating back to his role as a Software Design Engineer. Trained Cum Laude in Astronomy & Instrumentation (Leiden/Delft) with a BSc in Physics & Astronomy, he brings strong analytical rigor and mathematical optimization skills to complex pattern recognition and deep learning problems. He runs a consultancy company, WXCS, delivering high-performance software, neural network deployment and scientific modeling to clients across industries, which keeps him close to applied engineering challenges beyond ASML. Outside work he has practical leadership experience in grassroots organizations and long-term caregiving, demonstrating resilience and disciplined project ownership. Colleagues describe him as a pragmatic architect who blends academic depth with production-focused delivery.
code13 years of coding experience
job15 years of employment as a software developer
bookVWO, Nature and Technology, VWO, Nature and Technology at Jeroen Bosch College
bookBachelor of Science (BSc), Physics and Astronomy, Cum Laude (with Honors), GPA of 4.00, Bachelor of Science (BSc), Physics and Astronomy, Cum Laude (with Honors), GPA of 4.00 at Utrecht University
bookMaster's Degree, Astronomy & Instrumentation, Cum Laude (with Honors), GPA of 4.00, Master's Degree, Astronomy & Instrumentation, Cum Laude (with Honors), GPA of 4.00 at Leiden University and Delft University of Technology
languagesEnglish, Dutch, French, German
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Github Skills (2)

astronomy5
python4

Github contributions (1)

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OSCAAR/OSCAAR

May 2013 - May 2013

Contributions:34 commits in 10 days
pythonphotometryamateurastronomydifferential
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Luuk Visser - Software Platform Architect Metrology Expose DUV