Luuk Visser is a software platform architect with 13 years’ experience designing metrology and image-quality software for ASML’s DUV lithography products. He combines deep technical leadership—currently as Software Platform Architect Metrology Expose DUV—with hands-on algorithm and software design experience dating back to his role as a Software Design Engineer. Trained Cum Laude in Astronomy & Instrumentation (Leiden/Delft) with a BSc in Physics & Astronomy, he brings strong analytical rigor and mathematical optimization skills to complex pattern recognition and deep learning problems. He runs a consultancy company, WXCS, delivering high-performance software, neural network deployment and scientific modeling to clients across industries, which keeps him close to applied engineering challenges beyond ASML. Outside work he has practical leadership experience in grassroots organizations and long-term caregiving, demonstrating resilience and disciplined project ownership. Colleagues describe him as a pragmatic architect who blends academic depth with production-focused delivery.
13 years of coding experience
15 years of employment as a software developer
VWO, Nature and Technology, VWO, Nature and Technology at Jeroen Bosch College
Bachelor of Science (BSc), Physics and Astronomy, Cum Laude (with Honors), GPA of 4.00, Bachelor of Science (BSc), Physics and Astronomy, Cum Laude (with Honors), GPA of 4.00 at Utrecht University
Master's Degree, Astronomy & Instrumentation, Cum Laude (with Honors), GPA of 4.00, Master's Degree, Astronomy & Instrumentation, Cum Laude (with Honors), GPA of 4.00 at Leiden University and Delft University of Technology
Find and Hire Top DevelopersWe’ve analyzed the programming source code of over 60 million software developers on GitHub and scored them by 50,000 skills. Sign-up on Prog,AI to search for software developers.