Summary
Sungwon Kwon is a Principal Engineer with two decades of semiconductor R&D experience specializing in photolithography, plasma dry etching, and EUV mask/pellicle technologies. Based in Hwaseong, he leads small cross-functional teams at Samsung to develop High-NA EUV mask materials and etch processes, combining hands-on process work with lithography simulation and thin-film/MEMS fabrication expertise. His background spans conductor and high-k metal etch, ion beam techniques, and 300mm tool expertise from Applied Materials to Samsung, and includes patents on photomask fabrication and device methods. Known for a risk-taking, energetic approach and relentless curiosity, he has driven lifetime and contamination solutions for EUV masks and introduced actionable improvements to pellicle qualification. An awardee of the International TRIZ Association second level, he blends creative problem-solving with deep materials science training from Seoul National University.
11 years of coding experience
3 years of employment as a software developer
MS degree in Material Science & Engineering Material Science & Engineering, MS degree in Material Science & Engineering Material Science & Engineering at Seoul National University
Korean, English