Summary
Yanni Wang is a Process Development Engineer with nine years in semiconductor manufacturing, specializing in metal and dielectric CMP and deep familiarity with 7 nm FinFET process flows. At Micron and previously GLOBALFOUNDRIES, he has driven RIE and CMP tool qualification, throughput improvements, and statistical process control to meet device performance targets. He combines hands-on tool experience (AMAT, E-Bara, NOVA, HRP, OPI) with strong experimental design, troubleshooting, and data-analysis skills developed during a Ph.D. and internships at imec and Clarkson University. Yanni’s work spans materials characterization (AFM, XPS, FIB, XRD) and consumables evaluation, revealing a practitioner who links surface science to scalable fab processes. Based in Boise, he brings both academic depth and practical integration experience that reduces cycle time while sustaining Cp/Cpk for critical steps.
9 years of coding experience
2 years of employment as a software developer
Bachelor's degree, Chemical and Biomolecular Engineering, Bachelor's degree, Chemical and Biomolecular Engineering at Tianjin University
Ph.D., Chemical Engineering, Ph.D., Chemical Engineering at Clarkson University
Chinese, English